Tiger Optics’ HALO analyzers are the perfect solution for trace NH3 and H2O analysis in N2O product. They are ideally suited for ppb-to-ppm range measurements, with extremely fast response time (T90 < 3 minutes). The calibration-free advantage of Tiger analyzers also significantly decreases maintenance cost and total Cost-of-Ownership.
Enabling Ultimate Moisture Detection Performance in Semiconductor Manufacturing
As the International Roadmap for Devices and Systems (IRDS) drives the semiconductor industry beyond Moore’s Law and sets the requirements for the next decade, Tiger Optics accepts the challenge with the HALO KA Max H2O.
Building on Tiger Optics’ customer-acknowledged and renowned time-based technology—Continuous-Wave Cavity Ring-Down Spectroscopy—users can verify moisture impurity levels down to 100 ppt in semi bulk gases, with drift-free stability and virtually instant response to moisture upsets.
The HALO KA Max H2O, based on Tiger Optics’ latest platform, offers exceptional speed and further improved usability in an all-inclusive and compact form factor. The analyzer is fast to install, easy to use and effortless to maintain, with built-in zero verification. The HALO KA Max H2O excels in trace-level moisture detection in bulk gases and specialty gases used in semiconductor manufacturing.
Pair the HALO KA Max H2O with the HALO OK for ppt-level oxygen measurement to enjoy the benefits of advancements in laser-based technology for both of these critical contaminants.
Maximizing ultimate low-detection performance and speed of response, the HALO KA Max H2O offers:
- Parts per trillion (ppt) moisture detection capability in an array of gases
- Absolute measurement (freedom from calibration)
- Field proven lowest Cost of Ownership and ease of use
- Wide dynamic range—over four orders of magnitude
- Unprecedented speed of response at sub-ppb H2O levels
- Compact footprint (two HALO KA Max fit in a 19” rack)
|HALO Max QCL||✔||✔|
|HALO KA Max||✔||✔||✔|
|HALO H2O in N2O||✔|
|Spark / Spark+||✔||✔||✔||✔|
|T-I Max CEM||✔||✔||✔||✔||✔||✔*||✔|
*Detection is currently under development or available upon request.
Detection Ranges Summary
Application Feature: Semiconductor Fabrication