HALO RP H2O
Detections: H2O
Gas Type: UHP • CR • SP
This HALO RP model detects moisture impurities in chambers and semiconductor process tools down to 50 Torr of pressure in various background gases, incl. purge, cleaning and process gases.
Available Background Gases
N2 • He • Ar • H2 • CO • NH3 • PH3 • AsH3 • HCl
Features and Benefits
- Part-per-billion detection limits
- Calibration-free with zero drift
- Fast speed of response
- No consumables or maintenance
- Large selection of background gases
Applications
- Epitaxy
- MOCVD
Communication Interfaces
Ethernet, USB, RS-232, RS-485, 4-20mA analog, Modbus TCP (optional)
Options & Accessories
- Serani Max interface software
- Requires vacuum pump
- Corrosion-resistant model
HALO RP HF
Detections: HF
Gas Type: UHP • SP
This HALO RP model detects hydrogen fluoride impurities in low-pressure chambers and semiconductor process tools down to 50 Torr of pressure.
Available Background Gases
N2 • BF3
Features and Benefits
- Sub-part-per-billion detection limits
- Calibration-free with zero drift
- Fast speed of response
- No consumables or maintenance
Applications
- Epitaxy
- MOCVD
Communication Interfaces
Ethernet, USB, RS-232, RS-485, 4-20mA analog, Modbus TCP (optional)
Options & Accessories
- Serani Max interface software
- Requires vacuum pump
