Detections: H2O

Gas Type: UHP • CR

This HALO QRP is designed to monitor moisture impurities in state-of-the-art semiconductor process tools at pressures as low as 1 Torr.

Available Background Gases

N2 • He • Ar • H2 • HCl

Features and Benefits

  • Part-per-billion detection limits
  • Calibration-free with zero drift
  • No consumables or maintenance
  • Works over a wide pressure range from 1 Torr to 1000 Torr


  • Epitaxy
  • Atomic Layer Deposition (ALD)

Communication Interfaces

Ethernet, USB, RS-232, RS-485, 4-20mA analog, Modbus TCP (optional)

Options & Accessories

  • Serani Max interface software
  • Requires vacuum pump
  • Corrosion-resistant model

halo qrp tabelle