Single Channel Concentration Analyzer
CI -SEMI's in- line, wet process analysis system, the WetSpec201, enables non-contact real - time monitoring and closed- loop control of chemical composition in wet process applications. The WetSpec201 is the single-channel version of the well known WetSpec200 and provides cost-effective, small footprint solution.
The WetSpec201 is ideal for monitoring of cleaning, stripping and etching chemistries. Based on CI –SEMI’s novel algorithm, the WetSpec201 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and material waste. The system’s versatile software models enable soft -switch between different chemistries. When integrated into a control and spiking system, the WetSpec201 enables tighter process control and identifies process excursions before they affect yield.
Related Links and Documents
Continuous Monitoring and Control of CMP Slurry Health
Monitoring recirculated baths using NIR inline chemical analysis
Features and Benefits
- In-line, real-time monitoring of chemical concentration of liquids
- Cost efficient and small footprint
- No need for chemical sampling or dilution
- Short measurement time and low operational costs
- Simple switching between different chemistries
- Analysis of complex (multi-component) chemistries
- Real-time measurement enables closed loop control
- Up to 200 meters distance between analyzer and measuring cell enables placement of the analyzer in a convenient location
Typical Applications
Application | Component | Range, wt% |
SC1 | NH4OH | 0 – 6 |
H2O2 | 0 – 10 | |
SC2 | HCl | 0-4 wt% |
DSP (Dilute Sulfuric Peroxide) | H2SO4 | 8 – 13 |
H2O2 | 2 – 5 | |
HF/HCl | HF | 0-20 |
HCI | 0 – 1.2 | |
HF | HF | 0 – 20 |
Phosphoric | H3PO4 | 80-90 |
SPM | H2SO4 | 70-90 |
H2O2 | 0-10 | |
Hydrofluoric Peroxide | HF | 22 – 27 |
H2O2 | 13 – 17 | |
Buffered Oxide Etch | HF | 1 – 5 |
NH4F | 16 – 24 | |
Nitric/Acetic Acid | HNO3 | 1 – 4 |
CH3COOH | 8 – 12 | |
ACT 970 | Water | 14 – 19 |
EKC265 | Water | 16 – 28 |
ST-26S | Water | 5 – 20 |
ST-250 | Water | 34 – 38 |
Peroxide in CMP Slurry | H2O2 | 0 – 5 |
Ammonium Hydroxide | NH4OH | 0 – 5 |
Citric Acid | Citric Acid | 0 – 1.5 |
Other chemistries supported per request