The Challenge:

Many modern semiconductor epitaxy processes require gas mixtures with a precise and steady process gas to carrier gas ratio.

Tool Specification:   12% TCS at 12slpm  needed (example - other flows/gases/concentrations possible)

• Sophisticated Bubbler Temperatur and Pressure Control needed to avoid Variations in Concentration
• No Concentration Monitoring (APC)

The Solution:

The BCCS  delivers a steady  12% TCS at 12slpm (example - other flows/gases/concentrations possible)

• A low cost Bubbler System can be used
• Controlled Concentration at 12%
• In–Line Concentration Monitoring
• Calibration, Drift and Maintenance free design
• No need to install gas sensors inside process tool