The Challenge:

Many modern semiconductor epitaxy processes require gas mixtures with a precise and steady process gas to carrier gas ratio.

Tool Specification:   12% TCS at 12slpm  needed (example - other flows/gases/concentrations possible)

  • Sophisticated Bubbler Temperatur and Pressure Control needed to avoid Variations in Concentration
  • No Concentration Monitoring (APC)

bccs drawing

The Solution:

The BCCS  delivers a steady  12% TCS at 12slpm (example - other flows/gases/concentrations possible)

  • A low cost Bubbler System can be used
  • Controlled Concentration at 12%
  • In–Line Concentration Monitoring
  • Calibration, Drift and Maintenance free design
  • No need to install gas sensors inside process tool