The Multi-Max™ AMC Monitoring Solution

When product performance or yield loss is discovered at your final test stage, finding portential sources of defects as soon as possible is crucial to maintaining profitability. In many cases, the defects are caused by airborne molecular contaiminants (AMC), which The International Technology Roadmap for Semiconductors (ITRS) now highlights as a key technical challenge in achieving and sustaining low defect rates on devices.

The Multi-Max™ AMC Monitoring Solution is designed to quickly locate and to continuously monitor these invisible defect generators, commonly found lurking in and around equipment, personnel, wafer carriers, and cleanroom bays. It combines the T-I Max series CRDS analyzers that can detect and continuously monitor HF, HCl, and NH3 with an unprecedented combination of sensitivity, selectivity, and speed of response.

BENEFITS

• Up to 46 independent measuring inlet channels available
• Shortest distance of the sample gas flow path (reduced by more than 60% compared to the existing system)
• Minimize the use of contaminants such as fittings and tubing
• Various operation screens are provided for user convenience
  and can be programmed
• Minimization of contamination inside the sampler (automatic
  purge function when the system is stopped: CDA/PN2 required)
• Added reference function to check contamination
• Minimize preventive maintenance points (minimize internal
  inspections by making blocks)

Specifications