CI Semi, a division of CI Systems LTD, develops, manufactures and markets process monitoring and control systems for the semiconductor, solar PV, LED and FPD markets. Active in the semiconductor process equipment market since 1992, CI offers non contact wafer temperature monitors and wet process concentration monitors to OEMs and to end users.
CI Semi's family of noncontact temperature monitors (the NTM line), incorporate real-time, same point emissivity measurement and compensation making them the ideal solution for in situ process monitoring. CI’s family of wet process analyzers (WetSpec line) includes a range of monitors - from conductivity and NDIR solutions for concentration measurement in simple chemistries, to spectroscopic systems for measuring multiple constituents and residues in complex solutions.
Advanced Non-Contact Low Temperature Monitor
The NTM-W is an infrared radiometer, optimized for temperature measurement of opaque targets starting from below room temperature.
The high sensitivity and broad dynamic range allow very low temperatures to be accurately measured. Application dependent algorithms allow for subtraction of interfering background radiation.
Flexible design for OEM applications, allows up to four probes to measure synchronically, providing a cost effective measurement of several targets, or the uniformity of a single target.
V e r y L o w T e m p e r a t u r e N o n - c o n t a c t T e m p e r a t u r e M o n i t o r
The NTM VLT is is a non-contact electro-optical temperature monitor based on the measurement of temperature-dependent optical characteristics of semiconductor wafers. It can accurately measure temperatures at room temperature and below. The system is ideal for use with Si/InGaAs/InP wafers.
Wet process concentration analyzer - Multi Channel
CI-SEMI’s in-line, multi-channel wet process analysis system, WetSpec 200 enables non-contact real-time monitoring and closed-loop control of chemical composition in wet process applications. The WetSpec200 is ideal for monitoring, cleaning and etching chemistries. Based on CI-SEMI’s novel chemo-metric methodology, the WetSpec200 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and waste involved. The system’s versatile SW models enable soft-switch between different chemistries. With the capability to monitor up to eight flow cells in parallel, the WetSpec200 provides an efficient, low cost per channel process monitoring. When integrated into a control system, the WetSpec200 enables tighter process control and identifies process excursions before they affect yield.
Advanced In situ Emissivity Independent Non-contact Temperature Monitor
The NTM Delta is the only high accuracy and repeatability pyrometer which incorporates both real-time same-point emissivity and temperature measurement.
Its design is based on CI Semi’s well-known NTM500, with thousands of installations worldwide. The Delta’s rapid update rate and small footprint make it ideal for demanding applications such as RTP.
The high sensitivity and broad dynamic range allow low minimum temperatures to be accurately measured. Application- dependent algorithms allow for subtraction of interfering background radiation. The NTM Delta measures wafer temperatures in RTP, PVD, HDP-CVD, and other processes.
Wet process concentraton analyzer - Single Channel
CI -SEMI's in- line, wet process analysis system, the WetSpec201, enables non-contact real - time monitoring and closed- loop control of chemical composition in wet process applications. The WetSpec201 is the single-channel version of the well known WetSpec200 and provides cost-effective, small footprint solution.
The WetSpec201 is ideal for monitoring of cleaning, stripping and etching chemistries. Based on CI –SEMI’s novel algorithm, the WetSpec201 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and material waste. The system’s versatile software models enable soft -switch between different chemistries. When integrated into a control and spiking system, the WetSpec201 enables tighter process control and identifies process excursions before they affect yield.